When ASML's EUV lithography machine was still making 2nm and 1nm chips, American companies made a breakthrough in another advanced lithography direction. Zyvex used electron beam lithography technology to make 768 picometers, or 0.7nm chips, which can be used in quantum computers.
当ASML的EUV光刻机仍在为制造2nm，1nm当芯片担心时，美国公司在另一个先进的光刻方向上取得了突破，Zyvex采用电子束光刻技术制造768皮米，即0.7nm芯片，这种芯片可用于量子计算机。
The name of ZyvexLitho1 lithography system is ZyvexLitho1. Based on STM scanning tunneling microscope, a 0.7nm linewidth chip was fabricated by EBL electron beam lithography using tunneling microscope. This precision is much higher than that of EUV lithography system, equivalent to the total width of two silicon atoms. It is the highest precision lithography system at present.
Zyvex光刻系统的名称ZyvexLitho1，基于STM扫描隧道显微镜，使用隧道显微镜EBL电子束光刻制造了0.7nm线宽芯片，这种精度远高于EUV光刻系统，相当于两个硅原子的总宽度，是目前制造精度最高的光刻系统。
The chips manufactured by this lithography machine are mainly used for quantum computers, which can produce high-precision solid quantum devices, nano devices and materials, which are very important for the accuracy of quantum computers.
该光刻机制造的芯片主要用于量子计算机，可以制造高精度的固体量子设备、纳米设备和材料，这对量子计算机的精度非常重要。
ZyvexLitho1 is not only the most accurate electron beam lithography machine, but also commercially available. Zyvex has been able to accept orders from others, and the machine can be shipped within six months.
ZyvexLitho1不仅是精度最高的电子束光刻机，而且可商用，Zyvex公司已经能够接受他人的订单，机器可以在6个月内出货。
The precision of EBL electron beam lithography machine easily exceeds that of EUV lithography machine, but the shortcomings of this technology are also obvious, that is, the output is very low, and the chip cannot be manufactured on a large scale. It is only suitable for manufacturing small batches of high-precision chips or equipment, and it is unrealistic to hope to replace EUV lithography machine.
EBL电子束光刻机的精度很容易超过EUV光刻机，但该技术的缺点也很明显，即产量很低，不能大规模制造芯片，只适合制造小批量高精度芯片或设备，希望取代EUV光刻机也不现实。